How do you purify argon gas?

Argon is used as a protective gas in the manufacture of monocrystalline silicon and polycrystalline silicon. In order to improve the quality of silicon crystal, how to choose high purity argon is a topic in the manufacture of silicon crystal. By using a device for purifying argon gas, when the oxygen content in the argon gas purity is less than 1 ppm and the moisture content is less than 1 pm, the oxygen and carbon content of the produced single crystal silicon is less than 0.5 ppm, which improves the service life of the single crystal, can meet the requirements, and wins the satisfaction of customers and the market demand.

Since liquid Ar is not repurposed after gasifying, its oxygen content is generally 2 ppm to 5 ppm. Sometimes gas suppliers supply argon outside this range, and customers using argon are unaware of its quality, so the quality of the product often suffers. After using the device for purifying argon, regardless of the quality of the raw material argon, as long as the argon enters the crystallization furnace after being treated by the device, the purity is always constant.

Typically, the oxygen content is less than 0.5 ppm and the water content is less than 1 ppm. This stable purity of argon can ensure the quality of the crystal.

Method for purifying argon gas

The first is direct deoxygenation. It uses active metal to react with oxygen in argon and digest oxygen in argon to achieve the purpose of deoxidation. The water in the Ar is taken up through the sieve so that the water content in the Ar is less than 1 ppm.

Second, it uses getter. At a certain temperature, the getter can absorb nitrogen, hydrogen, oxygen, carbon monoxide, carbon dioxide, methane and other gases. After absorption treatment, the purity of argon can reach six to nine. This protective gas is more suitable for the production of high-purity semiconductor single crystal silicon.